3: Lithographic patterning of positive and negative tone resists (Dark... | Download High-Quality Scientific Diagram
Photoresists AZ and MicroChemicals TI resists
Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications | ACS Applied Materials & Interfaces
US9057960B2 - Resist performance for the negative tone develop organic development process - Google Patents